Hongfeng VAC's Kaufman Ion Source — Precision Ion Beam Solutions for Advanced Thin-Film Processing

 Xiangtan Hongfeng Mechanical Equipment Manufactory has been a trusted name in vacuum coating equipment since its founding in 2008. Drawing extensively from the design strengths of German, Japanese, Russian, and Italian counterparts, Hongfeng VAC has established itself as a specialized manufacturer of PVD (Physical Vapor Deposition) metal coating systems, covering three core technology categories: vacuum evaporation coating machines, magnetron sputtering coating machines, and arc deposition coating machines. With a dedicated team of vacuum industry experts guiding R&D and product design, Hongfeng delivers professional, custom-engineered solutions to clients worldwide.

Building upon this foundation, Hongfeng VAC proudly introduces its high-performance Gridded Kaufman Ion Source, engineered to deliver exceptional directional precision, stable plasma generation, and versatile process compatibility. Designed for seamless integration into both existing vacuum systems and new OEM platforms, Hongfeng’s Kaufman Ion Source provides a complete package—including the ion source, grid optics, and automated power supply controller—ready for immediate deployment across a wide range of advanced thin-film processing applications.

Hongfeng VAC’s Kaufman Ion Source employs a hot filament cathode to generate plasma within a well-designed discharge chamber. A precisely engineered double-grid ion extraction system then extracts and accelerates positive ions, forming a highly directional ion beam. This “gridded” design provides exceptional control over ion trajectories, enabling focused, parallel, or divergent beam profiles tailored to your specific process requirements.

The source operates in two primary modes:

Assist Mode — Energetic ions continuously act on the substrate or film surface, achieving effective surface cleaning and improving film microstructure.
Etching Mode — A specialized discharge chamber design yields a tightly focused ion beam, delivering an ion beam current density of up to 20 mA/cm² within a small beam spot (<5 cm), significantly enhancing sputtering rates and target utilization while reducing contamination from impurity atoms.

Key Features

  • Exceptional Directional Precision — The double-grid extraction system offers superior control over ion beam collimation, delivering a focused and well-aligned beam for precision etching, deposition, and cleaning processes.

  • High Current Density for Etching Mode — Achieve up to 20 mA/cm² within a <5 cm beam spot, enabling aggressive etching with high sputtering rates and minimal substrate damage.

  • Dual-Mode Operation — Seamlessly switch between assist mode (for surface cleaning and film modification) and etching mode (for precision material removal), maximizing process flexibility.

  • Customizable Design — The ion source is available with OEM/ODM customization options, including tailored dimensions, grid configurations, and mounting interfaces to meet specific system requirements.

  • Easy Integration — All designs are straightforward and can be easily retrofitted into existing vacuum systems or integrated into new OEM platforms.

  • Gas Compatibility — Compatible with inert gases (Ar, Kr, Xe), reactive gases (O₂, N₂), and mixed gas chemistries, supporting a wide array of process recipes.

  • Complete System Package — Each source is delivered as a comprehensive package, including the ion source, grid optics, and automated power supply controller, ready for direct integration.

  • Robust Build Quality — Manufactured under stringent quality control, Hongfeng’s ion sources are built to deliver reliable, long-lasting performance in demanding production environments.

Applications:

Hongfeng’s Kaufman Ion Source serves as a versatile workhorse across a broad spectrum of thin-film processing applications:

  • Sample Surface Cleaning / Activation — Remove native oxides, hydrocarbons, and surface contaminants at the atomic level prior to deposition, ensuring optimal film-to-substrate adhesion.

  • Ion Beam Sputtering Deposition (IBSD) — Direct the ion beam onto a target material to sputter atoms for thin film deposition with precise thickness and composition control.

  • Ion Beam Assisted Deposition (IBAD) — Employ dual ion sources: one facing the target material to extract material, the other facing the sample to assist in thin film deposition. This synergistic approach enhances film density, adhesion, and structural integrity.

  • Optical & Glass Component Coating — The clean process is particularly suitable for glass, optical components, and transparent parts requiring high-quality, defect-free coatings.

  • Surface Modification & Polishing — Tailor surface roughness, stress characteristics, and functional properties for advanced material engineering.

  • Precision Etching — Achieve anisotropic etching profiles with nanometer-level control for MEMS, sensors, and precision optics.

 

Hongfeng VAC’s Kaufman Ion Source is trusted across a diverse range of advanced technology sectors:

  • Optics & Photonics — Anti-reflection (AR) coatings, edge filters, band-pass filters, high-reflectivity mirrors

  • Precision Glass Processing — High-quality transparent coatings for optical lenses and glass components

  • Semiconductor & Microelectronics — Precision etching, surface preparation

  • MEMS, Sensors & Displays — Anisotropic etching, surface activation

  • Medical Devices — Bio-compatible coatings, surface functionalization

  • Aerospace & Defense — Durable optical coatings, sensor protection layers

  • Consumer Goods — Decorative and functional coatings for hardware, tools, and accessories

Each Hongfeng VAC's Kaufman Ion Source is designed for straightforward integration into both new OEM systems and retrofit applications for existing vacuum chambers. Hongfeng VAC provides:

  • Customizable dimensions and mounting interfaces to match your specific system requirements
  • Automated power supply controllers for precise process control
  • Complete technical documentation and application engineering support
  • OEM/ODM services for custom configurations
  • Global after-sales service and technical assistance