Small Planar Magnetron Cathode for Vacuum Applications

Planar Magnetron Sputtering Cathode is an advanced physical vapor deposition (PVD) technology, which is widely used to prepare various thin film materials, such as metals, semiconductors and insulators. 

Product description 
Planar magnetron sputtering cathode is an efficient coating equipment, which can increase the sputtering rate by introducing a magnetic field on the surface of the target cathode to improve the plasma density. This design not only improves the coating speed, but also reduces the thermal impact on the substrate, which is suitable for the preparation of high-quality films. 

Main features 
1. High efficiency: Planar magnetron sputtering cathode can achieve high-speed, low-temperature, low-damage sputtering process, suitable for large-scale production. 
2. Versatility: Various target materials (such as Au, Pt, Ag, Pd, etc.) can be used to meet the coating requirements of different materials. 
3. High uniformity: By optimizing the magnetic field design, uniform film distribution can be achieved and the performance consistency of products can be improved. 
4. Safety: Full closed-loop vacuum design and real-time monitoring system ensure the safe and stable operation of the equipment. 

Applications
Planar magnetron sputtering cathodes are widely used in the following fields: 
 -Semiconductor industry: for the preparation of conductive and insulating layers in integrated circuits. 
 -Optical coating: production of high-performance optical filters and mirrors. 
 -Magnetic materials: preparation of magnetic films, such as CoPt films. 
 -Decorative and protective coatings: provide wear-resistant and corrosion-resistant surface coatings for metal and plastic products. 

Technical advantages
 -High purity: The target materials and reaction gases used in reactive magnetron sputtering are of high purity, which is conducive to the preparation of high-purity compound films. 
 -Precise control: The film characteristics can be controlled by adjusting the process parameters to prepare films with different chemical ratios. 
 -Large area coating: suitable for the preparation of large area uniform film, suitable for industrial production.

Customized services
Hongfeng VAC offers customized sputtering cathode designs to meet specific application needs. Whether it is the selection of special targets or special coating processes, we can provide professional technical support and solutions.