Introducing the compact PVD multi-arc ion coating system specifically designed to meet the rigorous demands of academic research, graduate training, and interdisciplinary materials science.
Combining industrial-grade coating quality with a compact, user‑friendly footprint, this system empowers university labs to deposit high‑performance metallic, nitride, and carbide films (TiN, CrN, AlTiN, DLC, etc.) on virtually any substrate – from silicon wafers to 3D‑printed alloys.
Whether you are exploring tribological coatings, studying corrosion resistance, or training the next generation of thin‑film engineers, the NanoArc Lab Pro delivers repeatable, publication‑ready results with minimal operational overhead.
Key Features – Designed for the University Environment
1. Research‑Grade Precision
Up to 4 arc evaporation sources (cathodes) for multi‑material and alloy coatings
Closed‑loop current control (±0.5% stability) ensures exceptional reproducibility
Bias voltage range: 0 V to –1000 V DC/pulsed for dense, smooth microstructures
2. Small Footprint
Chamber size: Φ500 mm × 450 mm – fits on a standard lab bench or in a fume hood
Complete system weight: <980 kg (excluding vacuum pump) – no special floor reinforcement needed
3. Intuitive, Student‑Safe Operation
15″ touchscreen HMI with one‑click recipe management
Pre‑loaded coating protocols (TiN, CrN, ZrN, DLC) and full customisation for research
Automatic pump‑down, heating, etching, deposition, and venting – reduces training time by 60%
4. Safety & Compliance for Academic Labs
Interlocked chamber door, emergency stop, and arc‑containment shield
Exhaust gas filtration system (optional HEPA + activated carbon) for safe release of process gases
CE certified
5. Low Cost of Ownership
Consumables: only argon (99.99%) and standard target materials (Φ100 mm, 99.9% purity)
Built‑in self‑diagnostics with remote service support via Ethernet
No external cooling water required – air‑cooled arc sources and closed‑loop chiller optional
Technical Specifications:
| Parameter | Value |
|---|---|
| Chamber material | Stainless steel 304 |
| Ultimate pressure | 8.0×10⁻⁴ Pa (with turbo pump) |
| Working pressure | 0.1 – 2.0 Pa |
| Substrate heating | RT to 450 °C (PID control) |
| Deposition rate | 0.5 – 5 μm/h (depending on material) |
| Substrate rotation | 0 – 20 rpm (planetary or 2‑axis tilt) |
| Power supply | 3Phases 380 VAC, 50/60 Hz |
What’s Included?
Coating chamber with viewport
2 standard arc sources (expandable to 4)
DC pulsed bias power supply
Turbo molecular pump + rotary vane backing pump
15″ HMI control cabinet
Starter kit: Ti & Cr targets (2 each), substrate holder set, and maintenance tool kit
1‑year warranty + online training sessions for faculty/technicians
Applications
| Materials Science | Structure‑property relationships of hard coatings |
| Mechanical Engineering | Tribology, wear & friction studies |
| Physics | Thin‑film electrical/optical properties |
| Chemistry | Corrosion‑resistant and catalytic coatings |
| Nanotechnology | Multilayer and nanocomposite films |
| Senior Design Projects | Real‑world PVD process optimisation |