Vacuum Hybrid PVD Coating Unit

ARC-800 comes with both of cathodic arc evaporation and magnetron sputtering technologies in the same machine. The main features of ARC-800 are fast cycle times, easy operation and combines the advantages of multi arc and sputtering.  It has four high performance cathodic arc evaporation cathodes and cylindrical rotating magnetron sputtering cathode. It is the ideal choice for customers looking to obtain the most universal applications and multiple layers coatings in a small and smart PVD coater.

Hybrid vacuum coater mainly composed of vacuum system, multi-arc ion cathode, sputtering coating system, electrical control system, gas supply system, water cooling system and heating system. The vacuum system is used for ensuring the vacuum environment in the film coating process; the coating system comprises a cathode arc ion source and a magnetron sputtering target and is used for evaporating and sputtering target materials; the electrical control system is used for controlling the operation and process parameters of equipment; the gas supply system is used for providing gas required by film coating; the water-cooling circulation system is used for cooling equipment; and the heating system is used for adjusting the temperature in the film coating process. 
Small chamber size: Multi-arc magnetron coating machine usually uses a compact design, easy to install and move. 
High deposition rate of coating: due to the use of efficient cathodic arc ion discharge and magnetron sputtering technology, the deposition rate of coating is significantly improved. 
High utilization rate of the target: by optimizing the design and use of the target, the utilization rate of the target is improved and the cost is reduced. 
Good maneuverability: the equipment can be operated manually or fully automatically, which ensures the repeatability and consistency of the process. 
The film is uniform, compact and has good adhesion: in the coating process, the film is uniformly deposited on the surface of the workpiece to form a uniform, compact and good adhesion film. 

Technologies Applied:
Cathodic arc evaporation cathodes
Cylindrical rotating magnetron sputtering cathode

Advantages:
More possibilities of layers of coatings
High target utilization
High deposition rate
Quick cathode exchange
Better coating quality

Load and Cycle Times:
Max. load: 300kg
2 – 3 batches/day

Carousel:
Dual-rotation kicker carousel or triple-rotation gearbox system
Customized design is available

Controlling System:
Simple use and maintenance
Control system with touch screen
Data recording and real-time display of process parameters and flow
Manual and automatic process control

Machine Dimensions:
Footprint [mm]:  L2200 x W2500 x H2000