DC Magnetron Sputtering system is meticulously engineered to meet the rigorous demands of university teaching laboratories and advanced materials research. It provides an accessible, safe, and highly reproducible platform for depositing high-purity metallic and conductive thin films onto a variety of substrates.

Designed for ease of use without compromising on performance, this system allows students and researchers to transition seamlessly from theoretical materials science to hands-on experimental practice. Whether you are fabricating electrodes for organic electronics, coating samples for SEM analysis, or developing novel multilayer structures, this sputtering system delivers precise, consistent results.

Features & Benefits

  • User-Friendly Interface: The system is controlled via a 7-inch color touchscreen PLC, featuring preset "Recipe" modes for standard materials (e.g., Gold, Platinum, Titanium) and customizable multi-step programs for advanced research. Minimal training is required, making it ideal for shared laboratory environments.

  • Compact, Bench-top Design: With a small footprint, the Lab-Sputter 100 fits easily into standard fume hoods or on lab benches, conserving valuable cleanroom or laboratory space.

  • High Vacuum Capability: Achieves a base pressure of < 5.0 x 10⁻⁴ Pa using a integrated turbo-molecular pump and dry backing pump. This ensures minimal contamination and high purity of deposited films.

  • Precise Process Control: Equipped with a mass flow controller (MFC) for inert sputtering gas (Argon) and a manual or optional automatic pressure control valve, allowing for fine-tuning of deposition rates and film morphology.

  • Versatile Substrate Handling: Accommodates substrates up to 4 inches (100 mm) in diameter. The substrate holder can be optionally biased or heated up to 500°C to enhance film adhesion and tailor microstructures.

  • Comprehensive Safety: Interlocked doors, emergency stop, and water flow sensors ensure complete protection for operators and the equipment, meeting the highest laboratory safety standards.

Technical Specifications

Specification Details
Sputtering Method DC Magnetron Sputtering
Target Configuration Single target, 2.0" (50.8 mm) diameter, 0.125" (3.18 mm) thickness
Power Supply 3000W DC, Ripple < 5% (Constant Power / Current / Voltage modes)
Vacuum Chamber Stainless Steel (SS304) Cylindrical Chamber, approx. 250 mm diameter
Vacuum System < 5.0 x 10⁻⁴ Pa (Base)
Pumping Speed: 70 L/s Turbo Pump + 5 m³/h Dry Scroll Pump
Substrate Stage Rotating (0-20 RPM), with Shutter
Process Gas 1 Channel (Argon) with 0-100 sccm MFC
Control System PLC with 7" HMI Touchscreen, Recipe Storage
Dimensions 600 mm (W) x 600 mm (D) x 800 mm (H)
Weight Approx. 880 kg

Applications in Research & Education

The coating system is a workhorse for a wide spectrum of academic fields:

  • Materials Science: Fabrication of metallic thin films, multilayers, and diffusion barriers.

  • Nanotechnology: Deposition of contact electrodes for nanowires, nanotubes, and 2D materials (Graphene, MoS₂).

  • Energy Research: Coating current collectors for batteries and supercapacitors; back contacts for solar cells.

  • Microelectronics: Deposition of seed layers for lithography and interconnects.

  • Life Sciences: Preparing conductive coatings for non-conductive biological samples for Scanning Electron Microscopy (SEM) and Energy Dispersive X-ray Spectroscopy (EDS) analysis.

Why Choose This Coater for Your Lab?

  • Educational Value: Bridges the gap between classroom theory and real-world vacuum technology and plasma physics.

  • Research-Grade Results: Produces publication-quality thin films with thickness uniformity of better than ±5% across a 2" wafer.

  • Low Cost of Ownership: Robust construction and easily replaceable targets reduce long-term maintenance costs.

  • Plug-and-Play: Pre-assembled and tested prior to shipment. Includes installation and on-site training by our engineers.

Optional Upgrades:

  • RF Power Supply (for sputtering insulating materials like SiO₂, Al₂O₃)

  • Substrate Heating (Up to 800°C)

  • Thickness Monitor (Quartz Crystal Microbalance - QCM) for real-time deposition rate and thickness measurement.

  • Load-Lock Chamber for rapid sample exchange without venting the main chamber.