Our Hybrid PVD Coating System integrates Multi‑Arc Ion Plating and Mid‑Frequency (MF) Magnetron Sputtering in one advanced chamber. This combination delivers outstanding film adhesion, high density, and ultra-smooth surfaces for decorative, functional, and hard coatings on metals, ceramics, glass, and more.

Festures:

  • Multi‑Arc Cathodes – High ionization rate (>80%), strong adhesion, ideal for TiN, CrN, ZrN, TiAlN.

  • MF Sputtering Cathodes – 40 kHz dual‑target design, eliminates arcing and droplets, produces defect‑free metallic and oxide layers (TiO₂, Al₂O₃, SiO₂).

  • Hybrid Mode – Run arc only, sputter only, or co‑deposit to combine hardness and smoothness in one batch.

  • Low‑Temperature Process – Suitable for heat‑sensitive substrates.

  • PLC + HMI Control – Recipe management, data logging, remote diagnostics.

  • Large Chamber Options – Custom sizes from Ø800 mm to Ø1800 mm, planetary rotation for uniform coating (±5%).

Technical Specifications

Ultimate pressure <5×10⁻⁴ Pa
Arc sources 4–12 pcs (Φ60–Φ100mm)
MF sputtering power 5–40 kW
Bias voltage Pulsed DC, -100V ~ -500V
Heating temperature up to 450 °C
Process gases Ar, N₂, O₂, C₂H₂ (MFC controlled)
Substrate capacity up to 800 kg

Applications:

  • Cutting tools & molds (TiAlN, AlCrN, DLC)

  • Decorative coatings – gold, rose gold, black, blue on watch cases, jewellery, automotive trims

  • Stainless steel hardware (phone frames, faucets, door handles)

  • Optical & medical components (biocompatible coatings)

Why choose this machine?

  • Superior film quality – arc for adhesion + sputtering for smoothness

  • Higher productivity – simultaneous processes reduce cycle time

  • Green PVD – no toxic chemicals, no waste water

  • Global support – installation, training, spare parts, process lab

We offer tailor‑made solutions: chamber size, number of sources, load‑lock system, automatic loading, and more.

For detailed datasheet and quotation, please contact our sales team.