Elevate Your Coating Capabilities with High-Performance PVD Technology

Unlock superior hardness, wear resistance, and adhesion for your metal parts with our advanced PVD Magnetron Sputtering Coating System. Designed for industrial production of TiN, AlTiN, and other hard coatings, this machine delivers precision, reliability, and efficiency – all in a compact, single-chamber design.

Whether you are coating cutting tools, decorative components, or functional parts, our system ensures uniform film deposition, excellent vacuum performance, and user-friendly automation.

Features

  • High Vacuum Performance
    Ultimate vacuum: 5.0×10⁻⁴ Pa
    Fast pump-down: <8 minutes to 5.0×10⁻² Pa (from atmosphere, clean & dry)

  • Effective Plasma Cleaning
    Integrated 10kW ion source (XDD brand) for in-situ substrate cleaning – removes oil, dust, and oxides without wet chemicals.

  • Reliable Vacuum System

    • KYKY FF250/2000 turbo molecular pump (2000 L/s)

    • ZJP-70 roots booster + RVP-15 mechanical pump

    • Pneumatic high-vacuum valves for leak-free operation

  • Precision Magnetron Sputtering

    • Cylindrical MF magnetron cathodes (2 pairs, water-cooled)

    • 20kW MF power supply ×2 units (XDD, 40kHz, constant current/power)

    • 10kW pulsed bias power supply for enhanced adhesion

  • Intelligent Process Control

    • 15″ full-touch PLC screen with Panasonic modules

    • Automatic gas mixing (Ar, N₂, C₂H₂, etc.) via 4 mass flow controllers

    • PID temperature control (room temp to 500°C)

    • Emergency interlock & alarm system (low water pressure auto-shutdown)

  • Robust Chamber Construction

    • Vertical chamber, SUS304, inner surface polished

    • Water jacket cooling on chamber wall, door, and cathodes

    • Planetary rotation carousel (customizable jigs)

    • Reserved target position for future expansion

Technical Specifications

Parameter Value
Chamber Size Φ500 × 600 mm (H)
Substrate Material Metal parts (after pretreatment)
Main Coatings TiN, AlTiN, CrN, ZrN, and other hard coatings
Max. Vacuum Degree 5.0×10⁻⁴ Pa
Pump-down Time <8 min to 5.0×10⁻² Pa
Compressed Air 0.5 – 0.6 MPa
Cooling Water Requirement 2 Ton/hr, 2.0 kg/cm², 20±5°C
Total Installed Power ~75 kW (3-phase, 380V/50Hz)
Working Power Consumption ~50 kWh
Machine Dimensions (L×W×H) 2.3 × 1.6 × 1.95 m

What’s Included in the System?

  • Vacuum Chamber – with observation window, water jacket, heater (500°C), and removable scaleboard

  • Pumping System – mechanical pump, roots pump, turbo molecular pump, plus full pneumatic valves

  • Ion Source – 10kW plasma cleaning unit (XDD)

  • Magnetron Sputtering Sources – 2 pairs of cylindrical cathodes + 20kW MF power supplies (2 units)

  • Bias Power Supply – 10kW pulsed bias (XDD)

  • Gas Distribution – 4-channel MFCs, digital display, automatic gas mixing

  • Vacuum Measurement – Combined vacuum gauge (Reborn), Pirani & ionization gauges

  • Control System – 15″ touch PLC (Panasonic), full process automation

  • Safety & Utility – Auto venting, cooling water alarm, phase protection

⚠️ Targets, jigs, chiller, and process recipes are optional extras – please contact us for customization.

 
Applications

  • Cutting tools (drills, end mills, inserts)

  • Molds & dies (wear-resistant AlTiN coating)

  • Decorative hardware (gold, black, or rainbow TiN)

  • Automotive components (piston rings, valves)

  • Medical instruments (biocompatible coatings)

Why Choose Hongfeng VAC?

Xiangtan Hongfeng Mechanical Equipment Manufactory offers tailored PVD solutions – from standalone coaters to full coating lines. With deep experience in sputtering and arc deposition, we help you achieve:

  • Lower production cost – energy-efficient design, fast cycle times

  • Higher coating quality – uniform plasma, stable arc control

  • Easy operation – recipe storage, one-touch start, remote support

  • Global shipping – poly-wood crated, container-ready (20′)

Get a Quote Today

Ready to upgrade your coating line? Contact our team for a customized quotation – including optional titanium or TiAl targets, chillers, and substrate jigs.