HIPIMS Power Source for Thin Film Vacuum Deposition

HIPIMS power supply, namely high power pulsed magnetron sputtering power supply, is an advanced plasma power supply, which is widely used in various thin film deposition processes. The HIPIMS power supply generates a high-density plasma by applying a high-power pulse power supply in a short time to realize the high-quality deposition of the thin film. Its core is the pulse power characteristics, which mainly include pulse duration, pulse interval and peak power. HIPIMS power supply is widely used in various PVD (Physical Vapor Deposition) processes to prepare high-end metal decorative films, functional films and diamond-like carbon (DLC) films. Its typical applications include various functional films and hard films with high requirements for film compactness, such as rose gold mobile phone shell of iPhone, high-end watch shell, etc. 

Technical features

  High power pulse: HIPIMS power supply can provide high power output in a very short time, produce high-density plasma, and significantly improve the ionization rate of ions in the sputtering process. 
 Multiple adjustable parameters: The HIPIMS power supply has multiple adjustable parameters, such as pulse width, duty cycle, target voltage and peak current, which can be adjusted according to specific coating requirements to optimize the film deposition process. 
 High ionization rate: due to the introduction of high power pulse, HIPIMS technology can significantly improve the ionization rate of plasma, so that more target atoms are ionized to form an ion state deposited on the substrate, thereby significantly improving the compactness and uniformity of the film. 
 Good plating performance: The high-density plasma generated by HIPIMS power supply has good plating performance, which can make the film uniformly deposited on the complex surface shape. 
 Excellent color and luster of the film: The film prepared by HIPIMS technology usually has excellent color and luster and added value due to the improved uniformity of the film composition. 

Main Specifications:

Output Power : 20kW
Output Mode : DC output, Pulse output and DC superposed
Pulse output for magnetron sputtering
Operation Interface : Touch Screen Control
DC Mode Output : Constant Current
DC Voltage : ~800V
DC Max. Current : 15A
DC Power : 10kW
Pulse Mode Output : Constant Voltage
Maximum Pulse
Output Voltage : ～0 - 1000V
Pulse Power : 10kW
Maximum Pulse
Peak Current : 400A (adjustable set-point to avoid
overcurrent for various target size)
Pulse Width : ～25μs – 300μs (continuous adjustable)
Pulse Frequency : ～25Hz – 300Hz (continuous adjustable)
Arc Suppression : Equipped
Cooling Mode : Forced Air
Protection : over-voltage, over-current, over-heat
Waveform Output : BNC ports for oscilloscope to real-time
measurement of voltage and discharge current
Input Power : AC 380 V ± 5%, 50 Hz ± 5%, 60A, 3-phase
4-wire systems