Planar Magnetron Sputtering Cathodes For Thin Film Deposition
Magnetron sputtering cathode is a key component for material deposition through magnetron sputtering technology in a vacuum environment. Magnetron sputtering technology utilizes the interaction between magnetic field and electric field to improve the ionization rate and sputtering rate of plasma, thereby achieving efficient and uniform material deposition. The cathode target material can be metal, alloy, or ceramic materials. By precisely controlling the sputtering process, high-precision film thickness and good film layer quality can be achieved.
The design and optimization of magnetron sputtering cathodes are crucial for improving sputtering efficiency and film quality. Hongfeng VAC provides customized magnetron sputtering cathodes and offer our suggestions based on your requirements and applications.