Planar MF Magnetron Sputtering Cathode
Planar mid-frequency magnetron sputtering cathode is a key component in vacuum sputtering coating technology, which combines the advantages of mid-frequency power supply and planar magnetron sputtering technology, and is widely used in the preparation of various films. The working principle of planar MF magnetron sputtering cathode is based on magnetron sputtering technology. By introducing a magnetic field on the surface of the target cathode, the plasma density is increased by using the confinement of the magnetic field to the charged particles, thereby increasing the sputtering rate. Specifically, electrons fly to the substrate under the action of an electric field and collide with argon atoms on the way, ionizing them to produce Ar positive ions and new electrons. Under the action of the electric field, the Ar ions are accelerated to fly to the cathode target and bombard the surface of the target with high energy, so that the target material is sputtered. The sputtered atoms or molecules are deposited on the surface of the substrate to form the desired film.
Planar magnetron sputtering cathode is a magnetron sputtering system used for vacuum film deposition of various metal and non-metal sputtering. Hongfeng VAC provides non-standard customized sputtering cathode system.