Magnetron Sputtering Installation with Arc Evaporator

This sputtering coater comes with a set of cylindrical magnetron sputtering gun with DC sputtering power source.

It also comes with a set of arc evaporator to do plasma etching for activating the surface of substrates before sputtering coating.

The size of vacuum chamber is made to order. 

Maximum loading size: We design the vacuum chamber size and loading fixture according to customer requirements
Vacuum chamber type: Vertical
Vacuum chamber material: Stainless steel or carbon steel
PVD technology: DC magnetron sputtering or Mid-frequency sputtering
Vacuum pumping ability 8min can reach 0.05Pa
Vacuum system:     Turbo molecular pump or diffusion pump + roots pump + mechanical pump
Processing cycle: It takes less than 15 minutes to complete the process from substrate placement, sputtering, and removal. It also varies according to different processes.
Thickness monitor Optional
Sputtering materials:      Aluminum, copper, titanium, stainless steel, silver, etc. According to customer process requirements
Process gas:   Argon, nitrogen, oxygen, acetylene, etc