PVD Magnetron Sputtering Equipment
Magnetron sputtering is one of the PVD technolgies. It's universal for different applications. The processing materials can be plastic, ceramic, glass, and metals after pretreatment.
We choose different types of magnetron sputtering cathodes according to the applications. Planar and cylindrical sputtering cathodes are available.
Magnetron sputtering coating machine is an efficient surface treatment technology equipment, which is widely used in many fields.
Basic principle
The working principle of magnetron sputtering coating machine is based on sputtering coating technology, that is, high-energy particles (usually ions) are used to bombard the surface of the target material, so that the atoms or molecules of the target material get enough energy to escape and deposit on the substrate to form a film. In the process of magnetron sputtering, under the combined action of the electric field and the magnetic field, the electrons do circular motion on the target surface in an approximate cycloid form, so that the probability that the electrons collide with gas molecules to generate ions is increased, and the sputtering rate is improved.
Main components
Magnetron sputtering coating machine is mainly composed of vacuum system, sputtering system, heating system, cooling system, process gas distribution system and transmission system. The vacuum system is used for providing a coating environment with high vacuum degree; the sputtering system comprises a target, a cathode and other components and is used for generating sputtering atoms; the heating system and the cooling system are respectively used for controlling the temperature of the substrate and the target; the process gas distribution system is used for adjusting the gas atmosphere in the coating chamber; and the transmission system is used for controlling the moving speed and the position of the substrate.
Characteristics
High sputtering rate: Magnetron sputtering technology has a high sputtering rate, which can significantly improve production efficiency.
Low substrate temperature rise: As the electrons move in a circular motion near the target surface, the number of electrons directly bombarding the substrate is reduced, thereby reducing the temperature rise of the substrate.
The film-substrate bonding force is good: the sputtering atoms have high energy and can form good bonding force with the substrate.
Stable device performance: The magnetron sputtering coating machine has stable device performance, which can ensure the continuity and stability of the coating process.
Applications
Magnetron sputtering coating machines are widely used in many fields, including but not limited to:
Optical applications: It is used to prepare optical films, such as antireflection film, reflective film, etc.
Microelectronics: As a non-thermal coating technology, it is used in chemical vapor deposition (CVD) and other processes.
Decorative applications: It is used to prepare various decorative films, such as total reflection film, translucent film, etc.
Mechanical industry: It is used to prepare surface functional film, super hard film, self-lubricating film, etc. To improve the surface hardness, wear resistance and high temperature chemical stability of products.
Other applications: It is also used in high temperature superconducting thin films, ferroelectric thin films, giant magnetoresistance thin films, solar cells and other fields.