Ion Source Plasma Source Ion Generator Source
Applications of ion source
It can serve as a cleaning ion cleaning source for substrate surfaces.
It can directly deposit DLC and optical films, oxides, nitrides, etc. on flexible substrates as ion assisted deposition during magnetron sputtering process.
Characteristics of ion source
It has the characteristics of low air pressure, low voltage, and high beam current. The low-energy, high beam ion beam generated by the anode membrane ion source can effectively remove organic pollutants and oxide layers on the surface of the substrate, increase the adhesion of the film, and avoid damage to the substrate during bombardment (such as flat panel display coating and flexible substrate coating).
It can operate and produce stably for a long time. It has a very high mean time between failures and extremely high maintenance costs. The structure and material composition of the anode membrane ion source enable it to fully adapt to the majority of reaction gases, such as nitrogen, oxygen, and methane.