MF(Medium Frequency) Magnetron Sputtering Plasma Power Source

Medium frequency power supply is suitable for twin target magnetron sputtering, with a wide output frequency (20KHz~120KHz) and output power (20Kw~50Kw), advanced arc management technology and extremely low residual arc energy.

This power supply has mature applications in decorative plating and continuous plating (ITO film, solar cell production, flat panel display, dielectric film, etc.). It is suitable for a variety of processes and applications, and can deposit ultra-thin homogeneous films.