Planar Magnetron Sputtering Coating Cathodes
(Planar magnetron sputtering cathode)
(Magnetron sputtering coating process)
Applications:
Planar magnetron sputtering cathode is widely used to prepare various functional films, such as optical films, decorative films, wear-resistant films and so on. It also has important applications in microelectronics, optics, solar energy and other fields.
Characteristics:
The deposition temperature is low, the deposition speed is fast, the uniformity of the film is good, and the composition is close to that of the target. In addition, by adjusting the magnetic field distribution and process parameters, the coating quality and efficiency can be optimized.
Name: Customized planar magnetron sputtering cathode for PVD coating
Type: Rotary sputtering cathodes or cylindrical
Application: For magnetron sputtering deposition
Target material: Kind of high value target material, such as real gold, platinum, silver, etc, and those material can not be made in cylindrical type
Size: Customized
Power source: DC magnetron sputter power source
Installation direction: Vertical or horizontal