Plasma Generator for Magnetron Sputtering
DC magnetron sputtering power supply is suitable for metal films (such as gold, silver, titanium, aluminum, nickel, etc.) with uniform and high-quality film quality. This power supply is used for single cathode system and double cathode system of magnetron sputtering. High power output improves production efficiency. DC magnetron sputtering power supply is a kind of equipment which can provide the required power during the sputtering process. DC magnetron sputtering power supply has the characteristics of high efficiency, stability and reliability. It can provide stable electrical energy in the sputtering process to ensure the smooth progress of the sputtering process. At the same time, due to the use of magnetron technology, the trajectory and energy of sputtering electrons are more concentrated and stable, thus improving the sputtering efficiency and film quality.
Applications
Thin film preparation: It is widely used in the preparation of various thin films, such as metal, semiconductor, alloy, oxide, compound semiconductor, etc. These films have important applications in electronic industry, optical industry, medical and health fields.
Material processing: It can be used for surface modification, etching and other processing processes of materials to improve the performance and service life of materials.
Scientific research field: In the field of scientific research, DC magnetron sputtering power supply is also one of the commonly used experimental equipment, which is used to prepare and study various new materials and thin films.