Vacuum In-line Sputtering System with Multiple Chambers

Vacuum thin film deposition system can be used for preparing optical thin films, protective films, decorative films etc., has stable process performance and a modular structure, and adopts an industry-leading software control system. Magnetron sputtering coating line is an efficient, flexible and stable coating production equipment, which has a wide range of applications and development potential.

 

 Pretreatment: carry out cleaning, degreasing, derusting and other pretreatment on the substrate to ensure that the surface of the substrate is clean and free of impurities. 
 Vacuum pumping: start the vacuum pump system to pump each vacuum chamber to the required vacuum degree. 
 Heating and cooling: the substrate and the target are heated or cooled according to the requirements of the coating process. 
 Puttering and coating: introducing required gas into a vacuum chamber, applying an electric field and a magnetic field, and depositing target atoms on a substrate by sputtering to form a thin film. 
 Post-treatment: After the coating is completed, the substrate is cooled, cleaned and detected as necessary. 

Advantages

 High efficiency: multiple vacuum chambers can work in parallel, which greatly improves the coating efficiency. 
 Flexibility: Each vacuum chamber can independently adjust the gas parameters and coating process to meet the diverse coating needs. 
 Stability: Advanced control system and stable vacuum environment ensure the stability and consistency of the coating process. 
 Scalability: The number of vacuum chambers can be increased according to production requirements to achieve larger-scale coating production. 
 Environmental protection: There is no waste water and waste gas emission in the coating process, which meets the requirements of environmental protection. 

Technical Specifications