High Productive Circular Vacuum Arc Cathode Plasma Source
(Arc Cathode Plasma Source)
Service:
Development of coating deposition technologies with use of new plasma source.
Adaptation of the plasma source under the existing PVD equipment.
Description:
This plasma source is designed for high productivity and high quality of coatings deposited on industrial equipment for coating deposition.
Technical characteristics:
Output ion current for the arc current, usually 200A, up to 300A:
Diameter of the coating-100 mm with the thickness uniformity ± 5%;
Titanium coating deposition rate is better than 20 μm/h
Advantages:
Functional advantages:
1.5-2 times increase in coating equipment productivity;
Steady coating thickness with ± 5% uniformity;
Exclusion of the polishing of surface after coating deposition;
Increase productivity;
Cutting of costs due to the exclusion of surface polishing;
Stability of the source irrespective of the cathode burn level;
Simple design.
Applications:
Wear resistant coatings with low coefficient for friction elements of the machine parts in cutting tools industry, machinery, textile industry etc;
Multicomponent wear resistant coatings on the base of nitridescarbides, oxides or their mixtures for hardening of the precision tools,compressor and aviation engine blades;
Decorative coatings for furniture, lighting accessories, ceramic tile, mosacs, jewellery and watches, etc;
Biologically inert coatings, optically transparent, dielectric, corrosion resistant coatings;
Chemically inert coatings for optics, electronics, chemical machinery.