Planar Sputtering Gun with DC Power Supply
The working principle of planar magnetron sputtering is based on the physical vapor deposition (PVD) method. Under the condition of high vacuum, a proper amount of argon was filled, and a DC voltage was applied between the cathode (target) and the anode (coating chamber wall). Under the action of the electric field, the electrons collide with the argon atoms in the process of flying to the substrate, so that the argon atoms are ionized to generate Ar positive ions and new electrons. Under the action of the electric field, the Ar ions are accelerated to fly to the cathode target and bombard the surface of the target with high energy to sputter the target material. The sputtered atoms or molecules are deposited on the surface of the substrate to form a thin film.
This sputtering gun is designed to apply different metal coatings on substrated. It comes with a set of DC magnetron sputtering power source. The size of gun can be tailored. It can be used for compact small sputtering system or for inline sputtering lines in thin film industries.
If you need this accessory, please feel free to contact Hongfeng VAC.